Uploaded on Jul 22, 2022
Wafer coring is a process used to remove the core of a semiconductor wafer and create a flat surface for subsequent processes.
wafer coring
What Is Wafer Coring? Wafer coring is a process used to remove the core of a semiconductor wafer and create a flat surface for subsequent processes. This process is also called edge polishing or beveling and it improves the yield of post- processing by removing Epic defects. Wafer coring is usually done for silicon, ingots, or a combination of these. Listed below are some of the services that can be performed on wafers. Laser cutting The process of laser cutting wafers is used to create individual dies from a single wafer. This process involves a mechanical cutter that does not contact the top surface of the wafer, while a laser creates scribes in the wafer's surface. The laser then cuts the wafer's surface into individual dies. The laser's high speed and low thermal conductivity make it ideal for manufacturing complex electronic components. Mechanical dicing The mechanical dicing process of silicon wafers consists of spinning abrasive discs with diamond blades that are bonded to an electroplated nickel matrix. The spinning abrasive discs rotate at high speeds. This process has several challenges, including the possibility of clogging, changes in the nozzle adjustment, and operator error. In order to overcome these challenges, mechanical dicing requires an on-line monitoring system for blade torque. Die attach film A die attach film for wafer coring comprises an adhesive layer for attaching a semiconductor chip to a lead frame or wiring board. In one embodiment, the die attach film comprises a thickness ratio of 0.2 to 0.5. In another embodiment, the die attach film is a combination of two or more layers, and the thickness ratio is 0.1 to 0.25. The adhesive layer may be made from polyethylene terephthalate, polytetrafluoroethylene, polypropylene, or butadiene. Additional wafer flats To make semiconductor wafers smaller, they undergo processes called wafer coring. These processes include downsizing a silicon wafer to a desired diameter and thickness, as well as cutting, scribing, and full penetration cuts. While wafer coring can be performed on any size or shape of the silicon wafer, it is recommended to start with a sample. Additional wafer flats are useful for testing different coring techniques and evaluating the effectiveness of each method. Backgrinding Backgrinding is a process where the back side of a silicon wafer is ground to remove imperfections. The first step in this process is tape lamination, which attaches an adhesive tape to the front surface of the wafer. The silicon compound that forms the back side of the wafer spreads out in all directions during back grinding. The force of this grinding process can damage a wafer, particularly larger ones. To protect these softer wafers from damage, a thin blue tape is placed over the wafer to absorb any ultraviolet light.
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