Uploaded on Jul 22, 2022
Wafer coring is a process used to remove the core of a semiconductor wafer and create a flat surface for subsequent processes.
wafer coring
What Is Wafer Coring?
Wafer coring is a process used to remove the core of a
semiconductor wafer and create a flat surface for
subsequent processes. This process is also called edge
polishing or beveling and it improves the yield of post-
processing by removing Epic defects. Wafer coring is
usually done for silicon, ingots, or a combination of these.
Listed below are some of the services that can be
performed on wafers.
Laser cutting
The process of laser cutting wafers is used to create
individual dies from a single wafer. This process involves a
mechanical cutter that does not contact the top surface of
the wafer, while a laser creates scribes in the wafer's
surface. The laser then cuts the wafer's surface into
individual dies. The laser's high speed and low thermal
conductivity make it ideal for manufacturing complex
electronic components.
Mechanical dicing
The mechanical dicing process of silicon wafers consists of
spinning abrasive discs with diamond blades that are
bonded to an electroplated nickel matrix. The spinning
abrasive discs rotate at high speeds. This process has several
challenges, including the possibility of clogging, changes in
the nozzle adjustment, and operator error. In order to
overcome these challenges, mechanical dicing requires an
on-line monitoring system for blade torque.
Die attach film
A die attach film for wafer coring comprises an adhesive
layer for attaching a semiconductor chip to a lead frame or
wiring board. In one embodiment, the die attach film
comprises a thickness ratio of 0.2 to 0.5. In another
embodiment, the die attach film is a combination of two or
more layers, and the thickness ratio is 0.1 to 0.25. The
adhesive layer may be made from polyethylene
terephthalate, polytetrafluoroethylene, polypropylene, or
butadiene.
Additional wafer flats
To make semiconductor wafers smaller, they undergo
processes called wafer coring. These processes include
downsizing a silicon wafer to a desired diameter and
thickness, as well as cutting, scribing, and full penetration
cuts. While wafer coring can be performed on any size
or shape of the silicon wafer, it is recommended to start
with a sample. Additional wafer flats are useful for testing
different coring techniques and evaluating the effectiveness
of each method.
Backgrinding
Backgrinding is a process where the back side of a silicon
wafer is ground to remove imperfections. The first step in
this process is tape lamination, which attaches an adhesive
tape to the front surface of the wafer. The silicon
compound that forms the back side of the wafer spreads
out in all directions during back grinding. The force of this
grinding process can damage a wafer, particularly larger
ones. To protect these softer wafers from damage, a thin
blue tape is placed over the wafer to absorb any ultraviolet
light.
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