Semiconductor photoacid generators (PAGs) are critical components in photoresist formulations used in photolithography, especially for advanced semiconductor fabrication. The production of PAGs has experienced steady growth, driven by the global expansion of chip manufacturing and the shift toward smaller technology nodes such as 5nm and below. As demand increases from advanced chip fabs using deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography, manufacturers have been scaling up capacities. Major producers, including Tokyo Ohka Kogyo, JSR, and Sumitomo Chemical, are investing in R&D and expanding production capabilities, particularly in Asia and the U.S., to meet the stringent purity requirements and growing volume needs of leading-edge semiconductor facilities. PAGs for EUV, in particular, have seen heightened production development due to their enhanced acid generation efficiency and compatibility with high-resolution lithography.